NITW student secures all India first rank in GATE 2022 in Chemical Engineering
Warangal: A B.Tech Chemical Engineering final year student of the National Institute of Technology Warangal, (NITW) Tetala Mani Sandeep Reddy has secured the all India first rank in the GATE 2022 in Chemical Engineering. A resident of Boduppal in Hyderabad, Reddy was congratulated by institute Director, Prof N V Ramana Rao, Chemical Engineering Department’s head Dr Srinath and Prof Shireesh Sonewane here on Thursday.
While Sandeep Reddy’s father Rama Gopala Reddy is an electrical engineer in Hyderabad, his mother Iswarya Bhagya Laxmi, is a homemaker. “The credit goes to the professors of my department at NITW. Even though this year’s paper was tough, my professors guidance and teaching helped me in getting a good rank. I was expecting a rank below 50, however due to the difficulty of this year paper, I was able to get the first rank,” said Sandeep Reddy told Telangana Today over phone.
Reddy, a 22-year-old student of the 2018-22 batch, added that he was looking for a job in any public sector unit as he got the all India first rank. The Graduate Aptitude Test in Engineering (GATE) was held for admission into the masters programmes of IITs and IISC and recruitment by some Public Sector Companies.
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